High-efficiency Fresnel zone plates for hard X-rays by 100 keV e-beam lithography and electroplating

The efficiencies of several Fresnel zone plates, that were fabricated using a direct-write method with high-energy electrons, were measured over a wide range of photon energies.

[1]  Janos Kirz,et al.  Phase zone plates for x rays and the extreme uv , 1974 .

[2]  Michael Feser,et al.  Nanofabrication of high aspect ratio 24nm x-ray zone plates for x-ray imaging applications , 2007 .

[3]  Franz Pfeiffer,et al.  Fabrication of Fresnel zone plates for hard X-rays , 2007 .

[4]  Gerd Schneider,et al.  Cross‐linked polymers for nanofabrication of high‐resolution zone plates in nickel and germanium , 1995 .

[5]  C. H. Chen,et al.  Fabrication of high-aspect-ratio Fresnel zone plates by e-beam lithography and electroplating. , 2008, Journal of synchrotron radiation.

[6]  Jörg Raabe,et al.  Advanced thin film technology for ultrahigh resolution X-ray microscopy. , 2009, Ultramicroscopy.

[7]  SU-8 plating mold for high-aspect-ratio nickel zone plates , 2007 .

[8]  U. Vogt,et al.  Laboratory arrangement for soft x-ray zone plate efficiency measurements. , 2007, The Review of scientific instruments.

[9]  Qun Shen,et al.  Full-field hard x-ray microscopy below 30 nm: a challenging nanofabrication achievement , 2008, Nanotechnology.

[10]  C. David,et al.  Direct e-beam writing of high aspect ratio nanostructures in PMMA: A tool for diffractive X-ray optics fabrication , 2010 .

[11]  G. G. Stokes.  "J." , 1890, The New Yale Book of Quotations.

[12]  Joan Vila-Comamala,et al.  Direct e-beam writing of dense and high aspect ratio nanostructures in thick layers of PMMA for electroplating , 2010, Nanotechnology.

[13]  B. L. Henke,et al.  X-Ray Interactions: Photoabsorption, Scattering, Transmission, and Reflection at E = 50-30,000 eV, Z = 1-92 , 1993 .

[14]  I. Lin,et al.  E-beam lithography and electrodeposition fabrication of thick nanostructured devices , 2007 .

[15]  J. Gilman,et al.  Nanotechnology , 2001 .