Practical Work Function Tuning Based on Physical and Chemical Nature of Interfacial Impurity in Ni-FUSI/SiON and HfSiON Systems
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M. Sato | J. Koga | Y. Tsuchiya | T. Saito | K. Sekine | M. Koyama | M. Yoshiki | A. Nishiyama | T. Aoyama | K. Nakajima