Distributed feedback strained layer quantum well heterostructure 980 nm laser fabricated by two-step metalorganic chemical vapor deposition

Data are presented for single longitudinal mode, strained‐layer AlGaAs‐GaAs‐InGaAs quantum well heterostructure distributed feedback lasers emitting near 980 nm. Device fabrication consists of conventional holographic photolithography and two‐step metalorganic chemical vapor deposition growth. Regrowth over a GaAs grating layer and GaAs solid phase mass transport are discussed. The lasers are single mode up to twice Ith, have differential quantum efficiencies of 50%, and have threshold current densities of 600 A/cm2.

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