Band alignment at interfaces of few-monolayer MoS2 with SiO2 and HfO2
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I. Radu | A. Stesmans | C. Huyghebaert | M. Houssa | S. Gendt | V. Afanas'ev | D. Chiappe
暂无分享,去创建一个
I. Radu | A. Stesmans | C. Huyghebaert | M. Houssa | S. Gendt | V. Afanas'ev | D. Chiappe