论文信息 - Micron-thick ternary relaxor 0.36Pb(In1/2Nb1/2)O3–0.36Pb(Mg1/3Nb2/3)O3–0.28PbTiO3 thin films with superior pyroelectric response on Si substrate - 字舞流文

Micron-thick ternary relaxor 0.36Pb(In1/2Nb1/2)O3–0.36Pb(Mg1/3Nb2/3)O3–0.28PbTiO3 thin films with superior pyroelectric response on Si substrate

Xiangyong Zhao | Feifei Wang | C. Leung | Yanxue Tang | Chuanqing Li | Z. Duan | Tao Wang | Helezi Zhou | Zheng Wu | Jiaqian Yang | Hang Pan