Nucleation‐Limited Ferroelectric Orthorhombic Phase Formation in Hf0.5Zr0.5O2 Thin Films
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C. Hwang | S. Hyun | H. Kim | M. Park | T. Moon | H. Park | Young Hwan Lee | Keum Do Kim | Yong Bin Lee | Baek Su Kim | Jangho Roh | Jun Shik Kim | C. Yoo | B. Kim | Y. Lee