Influence of top surface passivation on bottom-channel hole mobility of ultrathin SiGe- and Ge-on-insulator
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Haigui Yang | H. Nakashima | H. Nakashima | K. Ikeda | Hongye Gao | S. Hata | Dong Wang | Kana Hirayama | K. Hirayama | Hong-ye Gao | Hideharu Nakashima