Zirconium-Aluminum-Oxide Dielectric Layer with High Dielectric and Relatively Low Leakage Prepared by Spin-Coating and the Application in Thin-Film Transistor
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Junbiao Peng | Junlong Chen | H. Ning | R. Yao | Wei Cai | Zhennan Zhu | Weijian Yuan | Shangxiong Zhou | Xiao Fu | Zhihao Liang | Rihui Yao | Junlong Chen