论文信息 - Copper-dielectric cap interface with enhanced reliability for 45nm technology and beyond - 字舞流文

Copper-dielectric cap interface with enhanced reliability for 45nm technology and beyond

Frank Feustel | Oliver Aubel | Ulrich Mayer | F. Feustel | O. Aubel | C. Hennesthal | Christian Hennesthal | Joerg Hohage | Matthias Lehr | J. Hohage | M. Lehr | U. Mayer

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[4] Matthias Lehr,et al. A copper-dielectric cap interface with high resistance to electromigration for high performance semiconductor devices , 2009 .