DEDICATED INSTRUMENTATION FOR HIGH SENSITIVITY, LOW FREQUENCY NOISE MEASUREMENT SYSTEMS

Low Frequency Noise Measurements (LFNM) can be used as very sensitive tool for the characterization o f the quality and the reliability of electron devices. However, especially in those cases in which the frequency range of interest extends below 1 Hz, instrumentation with an acceptable low level of background noise is not e asily found on the market. In fact, at very low frequencies, the flicker noise introduced by the electronic components which make up the instrumentation becomes predominant and several interesting phenomena which could be detected by means of LFNM may result completely hidden in the background noise. This consideration is not limited to the case of input preamplifiers but does extend to any piece of instrumentation that contributes to the LFNM systems, and in particular to the power supplies used for biasing the Device Under Test. During the last few years, our research groups have been strongly involved in the design of very low noise instrumentation for application in the field of LFNM. In this work we report the main results which we have ob tained together w ith a discussion of the d esign guidelines that have a llowed us, in a few cases, to reach noise levels not to be equalled by any instrumentation available on the market.

[1]  A. M. Yassine,et al.  Electromigration noise measurements using a novel AC/DC wafer-level noise measurement system , 1997 .

[2]  F. N. Hooge,et al.  1/⨍ noise in continuous thin gold films , 1969 .

[3]  Felice Crupi,et al.  Micro-prober for wafer-level low-noise measurements in MOS devices , 2003, IEEE Trans. Instrum. Meas..

[4]  Bruno Neri,et al.  Ultra low noise, PC-based measurement system for the characterization of the metallizations of integrated circuits , 1996 .

[5]  Giorgio Ferrari,et al.  Spectrum analyzer with noise reduction by cross-correlation technique on two channels , 1999 .

[6]  Bruno Neri,et al.  Noise and fluctuations in submicrometric Al-Si interconnect lines , 1997 .

[7]  P. Mazzetti,et al.  Application of the current noise technique to the investigation on dislocations in metals during plastic deformation , 1979 .

[8]  Ivan Ciofi,et al.  Temperature controlled oven for low noise measurement systems [for electromigration characterization] , 2000, IEEE Trans. Instrum. Meas..

[9]  Romano Giannetti,et al.  Ultra low-noise current sources , 1998, IEEE Trans. Instrum. Meas..

[10]  Felice Crupi,et al.  A new method for high-sensitivity noise measurements , 2002, IEEE Trans. Instrum. Meas..

[11]  A. Yassine,et al.  Characterization of probe contact noise for probes used in wafer-level testing , 1991, IEEE Electron Device Letters.

[12]  A. J. den Dekker,et al.  Model-based optical resolution , 1996 .

[13]  Massimo Macucci,et al.  Very sensitive measurement method of electron devices current noise , 1991 .

[14]  Bruno Neri,et al.  Low frequency noise evolution during lifetime tests of lines and vias subjected to electromigration , 2000 .

[15]  Bruno Neri,et al.  Wafer level measurement system for SARF characterization of metal lines , 1996 .

[16]  Bruno Neri,et al.  Ultralow-noise programmable voltage source , 1997 .

[17]  G. Scandurra,et al.  Improved trade-off between noise and bandwidth in op-amp based transimpedance amplifier , 2004, Proceedings of the 21st IEEE Instrumentation and Measurement Technology Conference (IEEE Cat. No.04CH37510).

[18]  J. L. Vossen,et al.  Screening of metal film defects by current noise measurements , 1973 .

[19]  Bruno Neri,et al.  Low-frequency noise measurements as a characterization tool for degradation phenomena in solid-state devices , 2000 .

[20]  C. Ciofi,et al.  Temperature controlled oven for low noise measurement systems , 1999, IMTC/99. Proceedings of the 16th IEEE Instrumentation and Measurement Technology Conference (Cat. No.99CH36309).

[21]  Felice Crupi,et al.  Very low-noise, high-accuracy programmable voltage reference , 2003, IEEE Trans. Instrum. Meas..

[22]  P. Mazzetti,et al.  Thermal-Equilibrium Properties of Vacancies in Metals through Current-Noise Measurements , 1976 .