Structural interpretations for some Raman lines from vitreous silica

Abstract An interpretation based on non-random structural features is advanced for the 490 and 604 cm−1 Raman lines from vitreous silica. The sharp, polarized 490 cm−1 line is considered to arise from a small concentration of planar rings involving three SiO 4 2 tetrahedra. The somewhat broader line at 604 cm−1 is thought to be associated with rings of various sizes, both planar and puckered, that are connected to the rest of the structure by elongated SiO bonds. Changes in the concentration and/or Raman scattering cross-section of these ring structures produced by changes in fictive temperature, neutron irradiation, high elastic tensile and compressive stresses, annealing, and by changes in the SiOH content are thought to produce the intensity variations observed in these two Raman lines.

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