A study of swing-curve physics in diffraction-based overlay
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Chan Hwang | Seung Yoon Lee | Se-Ra Jeon | Elliott McNamara | Arie den Boef | Kaustuve Bhattacharyya | Frank van de Mast | Marc Noot | Kuntack Lee | Greet Storms | Nang-Lyeom Oh | Joost van Heijst | Noh-Kyoung Park | SeungHwa Oh | Kevin An
[1] Arie den Boef,et al. On-product overlay enhancement using advanced litho-cluster control based on integrated metrology, ultra-small DBO targets and novel corrections , 2013, Advanced Lithography.
[2] Reinder Plug,et al. Improving on-product performance at litho using integrated diffraction-based metrology and computationally designed device-like targets fit for advanced technologies (incl. FinFET) , 2014, Advanced Lithography.
[3] Jan Mulkens,et al. High order field-to-field corrections for imaging and overlay to achieve sub 20-nm lithography requirements , 2013, Advanced Lithography.
[4] Jacky Huang,et al. Accuracy of diffraction-based and image-based overlay , 2011, Advanced Lithography.
[5] Ho-Kyu Kang,et al. The effect of individually-induced processes on image-based overlay and diffraction-based overlay , 2014, Advanced Lithography.
[6] Noelle Wright,et al. Evaluation of a new metrology technique to support the needs of accuracy, precision, speed, and sophistication in near-future lithography , 2009, Advanced Lithography.
[7] Arie den Boef,et al. Evaluation of a novel ultra small target technology supporting on-product overlay measurements , 2012, Advanced Lithography.
[8] Noelle Wright,et al. New approaches for scatterometry-based metrology for critical distance and overlay measurement and process control , 2011 .