Phase composition of SnOx thin films obtained by reactive d.c. sputtering

Abstract Thin films of SnOx were deposited on glass substrates by reactive d.c. sputtering and were analysed by X-ray diffraction and by Mossbauer spectroscopy. The quantities of β-Sn, α-SnO and SnO2 phases present depended on the oxygen concentration in the mixture of argon and oxygen that was introduced into the chamber during sputtering. Comparison of Mossbauer and X-ray spectra showed that for films obtained at low oxygen concentration (up to 10%) the SnO2 phase was present. This phase was detected in the Mossbauer spectra but was not observable in the X-ray spectra. Isomer shifts and quadrupole splittings are also discussed.