Extreme ultraviolet lithography mask patterning and printability studies with a Ta-based absorber
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Jonathan L. Cobb | Scott Daniel Hector | William J. Dauksher | Patrick A. Kearney | Pawitter J. S. Mangat | Marco Wedowski | David P. Mancini | Matthew A. Thompson | Craig C. Henderson | K. D. Cummings | Gregory Frank Cardinale | D. J. Resnick | K. Cummings | P. Kearney | M. Thompson | D. Resnick | S. Hector | W. Dauksher | C. Henderson | P. Mangat | G. Cardinale | M. Wedowski | J. Cobb
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