Design of surface patterns with optimized thermodynamic driving forces for the directed self-assembly of block copolymers in lithographic applications

It is well established by theory and experiment that lamella-forming block copolymers with characteristic periodicity, L0, can assemble into lines-and-spaces over carefully crafted chemically patterned substrates composed of stripes of width W that repeat with period LS. While previous works measured the efficacy of pattern designs for self-assembly through visual inspection of experimental images or examination of morphologies obtained from simulations, here we combine visual inspection over a large number of processing conditions with a new theoretical strategy that quantitatively measures the thermodynamic driving force of chemical patterns to produce a single grain of lines-and-spaces. The metric we use to describe the thermodynamic driving force is defined by the free-energy difference between the desired assembly of lines-and-spaces and the grain orientation with the lowest energy, referred to as the most competitive assembly. Visualization of experimental systems using SEM imaging provides a first-order approximation of the process windows in pattern design space in regard to W and the chemical contrast of the stripes and the background region, where the thermodynamic driving force is large enough to eliminate competitive grains. The strategy proposed in this work then uses complementary molecular simulations to elucidate which combination of these pattern parameters provides the largest driving force through free-energy calculations obtained by thermodynamic integration and attempts to identify which pattern designs minimize the probability of assembling lamellae that are stabilized at undesired angles to the patterned stripes. The combination of experiment and theory shows that narrow guiding stripes with width 0.4 ≤ W/L0 ≤ 0.8 that are highly preferential for one of the blocks are best for obtaining a directed self-assembly process flow with the highest probability of assembling a desired grain orientation.

[1]  Juan J. de Pablo,et al.  Cross-sectional Imaging of Block Copolymer Thin Films on Chemically Patterned Surfaces , 2010 .

[2]  Juan J. de Pablo,et al.  Free Energy of Defects in Ordered Assemblies of Block Copolymer Domains. , 2012, ACS macro letters.

[3]  Juan J. de Pablo,et al.  Interpolation in the Directed Assembly of Block Copolymers on Nanopatterned Substrates: Simulation and Experiments , 2010 .

[4]  David Andelman,et al.  Block Copolymer at Nano-Patterned Surfaces , 2010 .

[5]  C. Hawker,et al.  Controlling Polymer-Surface Interactions with Random Copolymer Brushes , 1997, Science.

[6]  E. Han,et al.  Effect of Composition of Substrate-Modifying Random Copolymers on the Orientation of Symmetric and Asymmetric Diblock Copolymer Domains , 2008 .

[7]  Hengpeng Wu,et al.  Geometric Control of Chemically Nano-patterned Substrates for Feature Multiplication Using Directed Self-Assembly of Block Copolymers , 2012 .

[8]  Eungnak Han,et al.  Fabrication of Lithographically Defined Chemically Patterned Polymer Brushes and Mats , 2011 .

[9]  Roel Gronheid,et al.  Three-Tone Chemical Patterns for Block Copolymer Directed Self-Assembly. , 2016, ACS applied materials & interfaces.

[10]  Mark Neisser,et al.  Implementation of a chemo-epitaxy flow for directed self-assembly on 300-mm wafer processing equipment , 2012 .

[11]  G. Fredrickson,et al.  Block Copolymers—Designer Soft Materials , 1999 .

[12]  Roel Gronheid,et al.  The role of guide stripe chemistry in block copolymer directed self-assembly , 2015, Advanced Lithography.

[13]  Juan J. de Pablo,et al.  Symmetric Diblock Copolymers Confined by Two Nanopatterned Surfaces , 2012 .

[14]  Juan J. de Pablo,et al.  Nonbulk Complex Structures in Thin Films of Symmetric Block Copolymers on Chemically Nanopatterned Surfaces , 2012 .

[15]  Marcus Müller,et al.  Monte Carlo Simulations of a Coarse Grain Model for Block Copolymers and Nanocomposites , 2008 .

[16]  Juan J. de Pablo,et al.  Dimensions and Shapes of Block Copolymer Domains Assembled on Lithographically Defined Chemically Patterned Substrates , 2007 .

[17]  Kris T. Delaney,et al.  Self-consistent field theory of directed self-assembly on chemically prepatterned surfaces , 2014, Advanced Lithography.

[18]  P. Nealey,et al.  Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates , 2003, Nature.

[19]  Marcus Müller,et al.  Directed self-assembly of block copolymers for nanolithography: fabrication of isolated features and essential integrated circuit geometries. , 2007, ACS nano.

[20]  William D. Hinsberg,et al.  Integration of Directed Self-Assembly with 193 nm Lithography , 2010 .

[21]  Roel Gronheid,et al.  Towards an all-track 300 mm process for directed self-assembly , 2011 .

[22]  M. Yeganeh,et al.  Effects of UV Irradiation and Plasma Treatment on a Polystyrene Surface Studied by IR−Visible Sum Frequency Generation Spectroscopy , 2000 .

[23]  Juan J. de Pablo,et al.  Control of Directed Self-Assembly in Block Polymers by Polymeric Topcoats , 2014 .

[24]  Joy Y. Cheng,et al.  Dense Self‐Assembly on Sparse Chemical Patterns: Rectifying and Multiplying Lithographic Patterns Using Block Copolymers , 2008 .

[25]  Juan J. de Pablo,et al.  Chemical Patterns for Directed Self-Assembly of Lamellae-Forming Block Copolymers with Density Multiplication of Features , 2013 .