Design of surface patterns with optimized thermodynamic driving forces for the directed self-assembly of block copolymers in lithographic applications
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Grant P. Garner | Juan J. de Pablo | Roel Gronheid | Paulina Rincon Delgadillo | Paul F. Nealey | P. Nealey | J. Pablo | R. Gronheid | Grant P. Garner
[1] Juan J. de Pablo,et al. Cross-sectional Imaging of Block Copolymer Thin Films on Chemically Patterned Surfaces , 2010 .
[2] Juan J. de Pablo,et al. Free Energy of Defects in Ordered Assemblies of Block Copolymer Domains. , 2012, ACS macro letters.
[3] Juan J. de Pablo,et al. Interpolation in the Directed Assembly of Block Copolymers on Nanopatterned Substrates: Simulation and Experiments , 2010 .
[4] David Andelman,et al. Block Copolymer at Nano-Patterned Surfaces , 2010 .
[5] C. Hawker,et al. Controlling Polymer-Surface Interactions with Random Copolymer Brushes , 1997, Science.
[6] E. Han,et al. Effect of Composition of Substrate-Modifying Random Copolymers on the Orientation of Symmetric and Asymmetric Diblock Copolymer Domains , 2008 .
[7] Hengpeng Wu,et al. Geometric Control of Chemically Nano-patterned Substrates for Feature Multiplication Using Directed Self-Assembly of Block Copolymers , 2012 .
[8] Eungnak Han,et al. Fabrication of Lithographically Defined Chemically Patterned Polymer Brushes and Mats , 2011 .
[9] Roel Gronheid,et al. Three-Tone Chemical Patterns for Block Copolymer Directed Self-Assembly. , 2016, ACS applied materials & interfaces.
[10] Mark Neisser,et al. Implementation of a chemo-epitaxy flow for directed self-assembly on 300-mm wafer processing equipment , 2012 .
[11] G. Fredrickson,et al. Block Copolymers—Designer Soft Materials , 1999 .
[12] Roel Gronheid,et al. The role of guide stripe chemistry in block copolymer directed self-assembly , 2015, Advanced Lithography.
[13] Juan J. de Pablo,et al. Symmetric Diblock Copolymers Confined by Two Nanopatterned Surfaces , 2012 .
[14] Juan J. de Pablo,et al. Nonbulk Complex Structures in Thin Films of Symmetric Block Copolymers on Chemically Nanopatterned Surfaces , 2012 .
[15] Marcus Müller,et al. Monte Carlo Simulations of a Coarse Grain Model for Block Copolymers and Nanocomposites , 2008 .
[16] Juan J. de Pablo,et al. Dimensions and Shapes of Block Copolymer Domains Assembled on Lithographically Defined Chemically Patterned Substrates , 2007 .
[17] Kris T. Delaney,et al. Self-consistent field theory of directed self-assembly on chemically prepatterned surfaces , 2014, Advanced Lithography.
[18] P. Nealey,et al. Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates , 2003, Nature.
[19] Marcus Müller,et al. Directed self-assembly of block copolymers for nanolithography: fabrication of isolated features and essential integrated circuit geometries. , 2007, ACS nano.
[20] William D. Hinsberg,et al. Integration of Directed Self-Assembly with 193 nm Lithography , 2010 .
[21] Roel Gronheid,et al. Towards an all-track 300 mm process for directed self-assembly , 2011 .
[22] M. Yeganeh,et al. Effects of UV Irradiation and Plasma Treatment on a Polystyrene Surface Studied by IR−Visible Sum Frequency Generation Spectroscopy , 2000 .
[23] Juan J. de Pablo,et al. Control of Directed Self-Assembly in Block Polymers by Polymeric Topcoats , 2014 .
[24] Joy Y. Cheng,et al. Dense Self‐Assembly on Sparse Chemical Patterns: Rectifying and Multiplying Lithographic Patterns Using Block Copolymers , 2008 .
[25] Juan J. de Pablo,et al. Chemical Patterns for Directed Self-Assembly of Lamellae-Forming Block Copolymers with Density Multiplication of Features , 2013 .