Preparation and performance of Si3N4 hollow microspheres by template method and carbothermal reduction nitridation.

Silicon nitride (Si3N4) hollow microspheres with smaller particle size and narrower distribution can be used to prepare closed-cell ceramics as pore-forming agent to improve the heat insulation performance and wave-transparent performance of porous Si3N4 ceramics. In this work, Si3N4 hollow microspheres with a diameter of about 1 μm and a wall thickness of approximately 150 nm were prepared by template method combined with carbothermal reduction nitridation (CRN) method. The optimum preparation temperature of the Si3N4 hollow microspheres is 1450 °C. The morphology, microstructure and phase composition of the prepared Si3N4 hollow microspheres were characterized. The formation mechanism of the Si3N4 hollow microspheres was discussed. The dielectric properties of Si3N4 hollow microspheres were measured using the waveguide method at 8.2~12.4 GHz. The results show that the wave-transparent performance of the Si3N4 hollow microspheres is similar to those of α-Si3N4 particles. It can be used as pore-forming agent or matrix for preparing porous Si3N4 ceramics with lightweight, heat insulating, wave-transparent and high-strength.

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