Photoinduced acid-catalyzed silicon dioxide formation at the polymer surface by chemical vapor deposition

Copolymers of 1,2,3,4-tetrahydro-1-naphtylideneamino-p-styrenesulfonate (NISS) and methyl, isopropyl or benzyl methacrylate were prepared by photoinitiated radical copolymerization. Since the NISS units of the polymers can form p-styrenesulfonic acid on UV irradiation, the irradiated polymers sorbed water from the atmosphere. The water sorption was studied. When the irradiated polymer films were exposed to the vapor of tetraalkyl orthosilicate, methyltrimethylsiloxane or methyltriethoxysilane, SiO 2 was formed at the near surface of the irradiated polymers