Computation lithography: virtual reality and virtual virtuality.

Computation lithography is enabled by a combination of physical understanding, mathematical abstraction, and implementation simplification. An application in the virtual world of computation lithography can be a virtual reality or a virtual virtuality depending on its engineering sensible-ness and technical feasibility. Examples under consideration include design-for-manufacturability and inverse lithography.

[1]  P. S. Hauge,et al.  Characterization of positive photoresist , 1975, IEEE Transactions on Electron Devices.

[2]  Roberto Guerrieri,et al.  Massively parallel algorithms for scattering in optical lithography , 1991, IEEE Trans. Comput. Aided Des. Integr. Circuits Syst..

[3]  F. Dill,et al.  In-situ measurement of dielectric thickness during etching or developing processes , 1975, IEEE Transactions on Electron Devices.

[4]  K. Yee.  Numerical solution of initial boundary value problems involving maxwell's equations in isotropic media , 1966 .

[5]  C. P. Kirk,et al.  Optical microscope imaging of lines patterned in thick layers with variable edge geometry: theory , 1988 .

[6]  Amyn Poonawala,et al.  Mask Design for Optical Microlithography—An Inverse Imaging Problem , 2007, IEEE Transactions on Image Processing.

[7]  Teruo Matsuzawa,et al.  Two-Dimensional Simulation of Photolithography on Reflective Stepped Substrate , 1987, IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems.

[8]  Lam,et al.  Iterative statistical approach to blind image deconvolution , 2000, Journal of the Optical Society of America. A, Optics, image science, and vision.

[9]  J. Sethian,et al.  Fronts propagating with curvature-dependent speed: algorithms based on Hamilton-Jacobi formulations , 1988 .

[10]  Roger Fabian W. Pease,et al.  Exploiting structure in fast aerial image computation for integrated circuit patterns , 1997 .

[11]  Stanley H. Chan,et al.  Initialization for robust inverse synthesis of phase-shifting masks in optical projection lithography. , 2008, Optics express.