Aluminum Oxide Doped with Erbium, Titanium and Chromium for Active Integrated Optical Applications

Summary Amorphous thin films with very low attenuation are grown by MO-PECVD. The modifications due to the annealing condition are subject of investigations. Aluminum oxide waveguides are doped with erbium for applications in telecommunication to develop an integrated optical amplifier. AlsoAl 2 O 3 doped with transition elements to develop tunable solid state lasers for spectroscopic measurements is of interest. Lasers with broadest fluorescence bands are Ti:Sapphire lasers or chromium doped specific crystals or glasses. In this paper the suitability of titanium and chromium doped aluminum oxide material as laser material is examined. Titanium and chromium doped waveguides have been annealed. Their fluorescence and lifetime measurements are presented.

[1]  B. Henderson,et al.  Optical spectroscopy of inorganic solids , 1989 .

[2]  C. Pecharromán,et al.  The infrared dielectric properties of η–Al_2O_3 , 1996 .

[3]  R Ulrich,et al.  Measurement of thin film parameters with a prism coupler. , 1973, Applied optics.

[4]  T. Maruyama,et al.  Chromium Oxide Thin Films Prepared by Chemical Vapor Deposition from Chromium Acetylacetonate and Chromium Hexacarbonyl , 1996 .

[5]  Y. Catherine,et al.  Plasma deposition of aluminum oxide films , 1988 .

[6]  G. A. Dorsey The Characterization of Anodic Aluminas I . Composition of Films from Acidic Anodizing Electrolytes , 1966 .

[7]  W. Lee,et al.  Compositional and structural analysis of aluminum oxide films prepared by plasma-enhanced chemical vapor deposition , 1994 .

[8]  G. Grand,et al.  Low-loss PECVD silica channel waveguides for optical communications , 1990 .

[9]  Folkert Horst,et al.  Wavelength division multiplexed add/drop ring technology in corporate backbone networks , 1998 .

[10]  T. Maruyama,et al.  Aluminum oxide thin films prepared by chemical vapor deposition from aluminum 2-ethylhexanoate , 1991 .

[11]  P. J. Reucroft,et al.  Fabrication of aluminum oxide thin films by a low‐pressure metalorganic chemical vapor deposition technique , 1993 .

[12]  P. J. Reucroft,et al.  Effect of water vapor on the growth of aluminum oxide films by low pressure chemical vapor deposition , 1993 .

[13]  L. A. Ryabova,et al.  The preparation of thin films of some oxides by the pyrolysis method , 1968 .