Novel high sensitivity EUV photoresist for sub-7nm node
暂无分享,去创建一个
Gijsbert Rispens | Marieke Meeuwissen | Rik Hoefnagels | Yasin Ekinci | Akihiro Oshima | Seiji Nagahara | Elizabeth Buitrago | Seiichi Tagawa | Takehiko Naruoka | Gosuke Shiraishi | Yukie Minekawa | Kosuke Yoshihara | Hisashi Nakagawa | Tomoki Nagai | Coen Verspaget | Raymond Maas | Yuichi Terashita | Oktay Yildirim | S. Nagahara | Y. Minekawa | Kosuke Yoshihara | S. Tagawa | A. Oshima | Tomoki Nagai | H. Nakagawa | Takehiko Naruoka | Gosuke Shiraishi | Y. Terashita | E. Buitrago | Y. Ekinci | O. Yildirim | M. Meeuwissen | R. Hoefnagels | G. Rispens | C. Verspaget | R. Maas
[1] C. Willson,et al. CHEMICAL AMPLIFICATION IN THE DESIGN OF POLYMERS FOR RESIST APPLICATIONS. , 1982 .
[2] C. G. Willson,et al. L'AMPLIFICATION CHIMIQUE APPLIQUEE AU DEVELOPPEMENT DE POLYMERES UTILISABLES COMME RESINES DE LITHOGRAPHIE. , 1982 .
[3] Yayi Wei,et al. Evaluation of EUV resist materials for use at the 32 nm half-pitch node , 2008, SPIE Advanced Lithography.
[4] S. Tagawa,et al. Super High Sensitivity Enhancement by Photo-Sensitized Chemically Amplified Resist (PS-CAR) Process , 2013 .