Barrier height estimation of asymmetric metal-insulator-metal tunneling diodes

A method is developed to estimate barrier heights of an asymmetric metal-insulator-metal (MIM) diode exhibiting Fowler-Nordheim tunneling. The method requires determination of slopes and intercepts of a log(|I(V+Δϕ)2|) versus 1V+Δϕ plot rather than a log(|I(V)2|) versus 1V plot (i.e., a conventional Fowler-Nordheim plot), where I, V, and Δϕ refer to tunneling current, applied voltage, and the difference in barrier heights, respectively. As the value of Δϕ directly impacts the applied electric field magnitude, it is a critical component in barrier height determination from a current-voltage measurement. Conventional Fowler-Nordheim plot analysis does not employ Δϕ, which compromises the accuracy of barrier height estimation when Δϕ≠0. Using the described method, the barrier heights of a ZrCuNiAl/Al2O3/Al MIM diode are estimated to be 1.75 V and 1.07 V, respectively, and the Al2O3 tunneling effective mass is estimated to be 0.47. Additional MIM diodes are analyzed to show that the accuracy of MIM diode barr...

[1]  W. Stickle,et al.  Engineering anisotropic dielectric response through amorphous laminate structures , 2012 .

[2]  Andreas Schenk,et al.  Modeling and simulation of tunneling through ultra-thin gate dielectrics , 1997 .

[3]  J. Simmons Electric Tunnel Effect between Dissimilar Electrodes Separated by a Thin Insulating Film , 1963 .

[4]  J. Simmons Generalized Formula for the Electric Tunnel Effect between Similar Electrodes Separated by a Thin Insulating Film , 1963 .

[5]  Sergio E. Ulloa,et al.  A theoretical study of an amorphous aluminium oxide layer used as a tunnel barrier in a magnetic tunnel junction , 2007 .

[6]  D. Arnold,et al.  Impact ionization, trap creation, degradation, and breakdown in silicon dioxide films on silicon , 1993 .

[7]  John Robertson,et al.  Oxygen vacancy levels and electron transport in Al2O3 , 2010 .

[8]  Parmanand Sharma,et al.  Nanoscale patterning of Zr-Al-Cu-Ni metallic glass thin films deposited by magnetron sputtering. , 2005, Journal of nanoscience and nanotechnology.

[9]  R. Fowler,et al.  Electron Emission in Intense Electric Fields , 1928 .

[10]  Nasir Alimardani,et al.  Advancing MIM Electronics: Amorphous Metal Electrodes , 2011, Advanced materials.

[11]  Tierney,et al.  Ballistic electron transport in thin silicon dioxide films. , 1987, Physical review. B, Condensed matter.

[12]  Tzu-Ying Lin,et al.  Energy-band parameters of atomic-layer-deposition Al2O3/InGaAs heterostructure , 2006 .

[13]  Arnold,et al.  Theory of high-field electron transport and impact ionization in silicon dioxide. , 1994, Physical review. B, Condensed matter.

[14]  R A Millikan,et al.  Relations of Field-Currents to Thermionic-Currents. , 1928, Proceedings of the National Academy of Sciences of the United States of America.

[15]  Richard G. Forbes,et al.  Refining the application of Fowler–Nordheim theory , 1999 .

[16]  Eric Garfunkel,et al.  Band offsets of ultrathin high- κ oxide films with Si , 2008 .

[17]  J. P. Gambino,et al.  Determination of the Fowler–Nordheim tunneling parameters from the Fowler–Nordheim plot , 2001 .