Characterization of broadband emission around 40 nm from potassium plasma
暂无分享,去创建一个
Toyohiko Yatagai | Takeshi Higashiguchi | Noboru Yugami | Takamitsu Otsuka | Gerard O'Sullivan | Hiromitsu Terauchi | Padraig Dunne | Mami Yamaguchi | Rebekah M. D'Arcy
[1] T. Ohtsubo,et al. Removal of oxygen atoms from a SiO2 surface by incoherent vacuum ultraviolet excimer irradiation , 2002, CLEO 2002.
[2] H. Griem. Principles of Plasma Spectroscopy , 1997 .
[3] Gregory J. Tallents,et al. Optical lithography: Lithography at EUV wavelengths , 2010 .
[4] Toyohiko Yatagai,et al. Rare-earth plasma extreme ultraviolet sources at 6.5―6.7 nm , 2010 .
[5] Georg Soumagne,et al. Enhancement of extreme ultraviolet emission from a CO2 laser-produced Sn plasma using a cavity target , 2007 .
[6] Toyohiko Yatagai,et al. Systematic investigation of self-absorption and conversion efficiency of 6.7 nm extreme ultraviolet sources , 2010 .
[7] Shoichi Kubodera,et al. Mass spectrometric study of photo dissociation of organic molecules by vacuum-ultraviolet irradiation for development of analysis technique , 2009 .
[8] C. Cerjan,et al. Conversion efficiencies from laser-produced plasmas in the extreme ultraviolet regime , 1996 .
[9] Hiroki Tanaka,et al. Comparative study on emission characteristics of extreme ultraviolet radiation from CO2 and Nd:YAG laser-produced tin plasmas , 2005 .
[10] R. D. Cowan,et al. The Theory of Atomic Structure and Spectra , 1981 .
[11] Hiroaki Nishimura,et al. Characterization of extreme ultraviolet emission using the fourth harmonic of a Nd:YAG laser , 2005 .
[12] Tsuneo Ajioka,et al. Effects of surface hydrogen on the air oxidation at room temperature of HF‐treated Si (100) surfaces , 1990 .
[13] T. Fujimoto,et al. Kinetics of ionization-recombination of a plasma and population density of excited ions. I - Equilibrium plasma. II - Ionizing plasma , 1979 .
[14] Toyohiko Yatagai,et al. Characteristics of extreme ultraviolet emission from a discharge-produced potassium plasma for surface morphology application , 2010 .
[15] Sho Amano,et al. Laser wavelength and spot diameter dependence of extreme ultraviolet conversion efficiency in ω, 2ω, and 3ω Nd:YAG laser-produced plasmas , 2005 .
[16] G. Tonon,et al. X‐ray emission in laser‐produced plasmas , 1973 .
[17] Padraig Dunne,et al. Optimizing 13.5nm laser-produced tin plasma emission as a function of laser wavelength , 2007 .
[18] Masahito Katto,et al. Silicon Nitride Film Deposition by Photochemical Vapor Deposition Using an Argon Excimer Lamp , 2007 .