Integrating high-quality dielectrics with one-nanometer equivalent oxide thickness on two-dimensional electronic devices
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X. Duan | Zhihao Yu | Yun Wu | Tangsheng Chen | Xinran Wang | Weisheng Li | Peng Wang | Jian Zhou | S. Cai | Jialin Zhang | N. Fang | Xiaoyu Xie | Hai-bo Ma | Ke Yan | N. Dai | Xiangjin Wu | Huijuan Zhao | Zixuan Wang | Daowei He | Lijia Pan | Yi Shi | Wei Chen | K. Nagashio | Taotao Li