论文信息 - Low-temperature ALD process development of 200 mm wafer-scale MoS2 for gas sensing application - 字舞流文

Low-temperature ALD process development of 200 mm wafer-scale MoS2 for gas sensing application

A. Ostendorf | A. Devi | M. Becher | A. Grabmaier | C. Bock | R. Neubieser | Jan‐Lucas Wree | J. Jagosz | M. Michel | J.-L. Wree