Gas Diffusion Barriers on Polymers Using Multilayers Fabricated by Al2O3 and Rapid SiO2 Atomic Layer Deposition

Single Al2O3 atomic layer deposition (ALD) films on polymers have demonstrated excellent gas diffusion barrier properties. Further improvements can be achieved using multilayers of Al2O3 ALD layers with other inorganic layers. In this study, multilayers of Al2O3 ALD and rapid SiO2 ALD were grown on Kapton and heat-stabilized polyethylene naphthalate substrates. Transmission rates for tritium through the films were measured using the radioactive HTO tracer method. Comparison with previous Ca tests and tritium exchange experiments with alcohols indicated that the tritium in HTO may diffuse as either molecular HTO or atomic tritium. Assuming that the tritium diffuses only as HTO, single Al2O3 ALD films reduced the effective water vapor transmission rate (WVTR) to ∼1 × 10-3 g/m2/day. When the Al2O3 ALD film was directly exposed to the saturated H2O/HTO vapor pressure, the barrier properties deteriorated markedly after 4−5 days. Al2O3 ALD barriers that were not subjected to direct H2O/HTO exposure indefinitely...

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