Advanced CD error detection with CD SEM disposition

In this study, we used production reticles and a new programmed defect test mask to characterize the sensitivity and false defect performance of several algorithms (ALM100, ALM200 and ALM300). ALM300's sensitivity spec is 60 nm. The inspection results were transferred to a CD SEM for analysis. SEM measurements were taken to validate the sensitivity of the algorithm and to quantify the calibration accuracy of the review tools of the inspection system.