High-sensitivity molecular organometallic resist for EUV (MORE)
暂无分享,去创建一个
Yasin Ekinci | Michaela Vockenhuber | Robert L. Brainard | Ryan Del Re | James Passarelli | Miriam Sortland | Daniel A. Freedman | Michael Murphy | Mark Neisser | Levi Dousharm
[1] Ionel Haiduc,et al. Basic Organometallic Chemistry , 1985 .
[2] Wen-li Wu,et al. Characterization of the Photoacid Diffusion Length and Reaction Kinetics in EUV Photoresists with IR Spectroscopy , 2010 .
[3] G. Barney Ellison,et al. Bond Dissociation Energies of Organic Molecules , 2003 .
[4] G.D. Hutcheson. Extreme ultraviolet lithography: will it be ready in time? , 2001, IEEE Spectrum.
[5] H. Schlegel,et al. A REASSESSMENT OF THE BOND DISSOCIATION ENERGIES OF PEROXIDES. AN AB INITIO STUDY , 1996 .
[6] B. L. Henke,et al. X-Ray Interactions: Photoabsorption, Scattering, Transmission, and Reflection at E = 50-30,000 eV, Z = 1-92 , 1993 .
[7] Evangelos Gogolides,et al. Effects of photoresist polymer molecular weight on line-edge roughness and its metrology probed with Monte Carlo simulations , 2004 .