Simulating anisotropic etching of silicon in any etchant: evolutionary algorithm for the calibration of the continuous cellular automaton
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Miguel A. Gosálvez | Néstor Ferrando | R. Gadea | Yan Xing | Prem Pal | K. Sato | N. Ferrando | R. Gadea | Y. Xing | M. Gosálvez | P. Pal | Kazuo Sato | J. Cerdá | J. Cerdá | Yan Xing | Kazuo Sato
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