Time-of-flight mass spectrometry diagnostics in deep oscillation magnetron sputtering (DOMS) of titanium

Reflectron-type time-of-flight mass spectrometry was applied to the time-resolved component analysis of deep oscillation magnetron sputtering (DOMS), which has been developed as a technique of modulated pulsed magnetron sputtering. In the present study, the DOMS of a Ti target was performed under an Ar gas atmosphere by using a DOMS-specific control waveform consisting of 25 current and/or power pulses. The time evolution of the formation of ionized species (Ar+, Ar2+, Ti+, and Ti2+) after the application of the first discharge pulse was observed at the position corresponding to the deposition region. This study revealed that the plasma build-up process from non-metallic plasma to metallic plasma takes approximately two micropulses (around 100  μs from ignition) in DOMS discharge. In addition, we have found the possibility of studying sputtering processes, such as the rarefaction, and refilling processes of Ar as a function of pulse number through DOMS research.

[1]  K. Fuke,et al.  Delayed Discharge Bridging Two Sputtering Modes from Modulated Pulsed Power Magnetron Sputtering (MPPMS) to Deep Oscillation Magnetron Sputtering (DOMS) , 2021, Plasma.

[2]  J. Hnilica,et al.  Ionisation fractions of sputtered titanium species at target and substrate region in HiPIMS , 2020, Plasma Sources Science and Technology.

[3]  K. Koyasu,et al.  Time-of-flight mass spectrometric diagnostics for ionized and neutral species in high-power pulsed magnetron sputtering of titanium , 2020, Japanese Journal of Applied Physics.

[4]  J. Gudmundsson,et al.  A unified treatment of self-sputtering, process gas recycling, and runaway for high power impulse sputtering magnetrons , 2017 .

[5]  A. Cavaleiro,et al.  Hard and dense diamond like carbon coatings deposited by deep oscillations magnetron sputtering , 2017 .

[6]  A. Anders.  Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS) , 2017 .

[7]  J. Gudmundsson,et al.  Are the argon metastables important in high power impulse magnetron sputtering discharges , 2015 .

[8]  W. Sproul,et al.  Structure and properties of Cr2O3 coatings deposited using DCMS, PDCMS, and DOMS , 2015 .

[9]  M. Lei,et al.  On the pressure effect in energetic deposition of Cu thin films by modulated pulsed power magnetron sputtering: A global plasma model and experiments , 2015 .

[10]  S. Konstantinidis,et al.  Particle visualization in high-power impulse magnetron sputtering. II. Absolute density dynamics , 2015 .

[11]  S. Konstantinidis,et al.  Particle visualization in high-power impulse magnetron sputtering. I. 2D density mapping , 2015 .

[12]  W. Sproul,et al.  Diamond like carbon films deposited by HiPIMS using oscillatory voltage pulses , 2014 .

[13]  A. Cavaleiro,et al.  Effect of peak target power on the properties of Cr thin films sputtered by HiPIMS in deep oscillation magnetron sputtering (DOMS) mode , 2014 .

[14]  R. Franz,et al.  Observation of multiple charge states and high ion energies in high-power impulse magnetron sputtering (HiPIMS) and burst HiPIMS using a LaB6 target , 2014 .

[15]  J. Benedikt,et al.  Origin of the energetic ions at the substrate generated during high power pulsed magnetron sputtering of titanium , 2013, 1311.7545.

[16]  J. Benedikt,et al.  Dynamic of the growth flux at the substrate during high-power pulsed magnetron sputtering (HiPIMS) of titanium , 2013 .

[17]  S. Konstantinidis,et al.  Rarefaction windows in a high-power impulse magnetron sputtering plasma , 2013 .

[18]  L. Martinu,et al.  Deposition rate enhancement in HiPIMS without compromising the ionized fraction of the deposition flux , 2013 .

[19]  S. Konstantinidis,et al.  Mass spectrometry diagnostics of short-pulsed HiPIMS discharges , 2013 .

[20]  W. Sproul,et al.  Anatase and rutile TiO2 films deposited by arc-free deep oscillation magnetron sputtering , 2013 .

[21]  L. Martinu,et al.  Pulse management in high power pulsed magnetron sputtering of niobium , 2012 .

[22]  U. Helmersson,et al.  High power impulse magnetron sputtering discharge , 2012 .

[23]  L. Martinu,et al.  The ‘recycling trap’: a generalized explanation of discharge runaway in high-power impulse magnetron sputtering , 2012 .

[24]  Guodong Gu,et al.  Ion formation in millisecond pulsed glow discharge plasmas , 2011 .

[25]  J. Bradley,et al.  The evolution of the plasma potential in a HiPIMS discharge and its relationship to deposition rate , 2010 .

[26]  W. Sproul,et al.  Modulated pulse power sputtered chromium coatings , 2009 .

[27]  B. Mishra,et al.  Ion energy and mass distributions of the plasma during modulated pulse power magnetron sputtering , 2009 .

[28]  U. Helmersson,et al.  The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge , 2006 .

[29]  U. Helmersson,et al.  Ionized physical vapor deposition (IPVD): A review of technology and applications , 2006 .

[30]  D. Christie.  Target material pathways model for high power pulsed magnetron sputtering , 2005 .

[31]  J. Musil,et al.  Pulsed dc magnetron discharge for high-rate sputtering of thin films , 2001 .

[32]  R. Steiner,et al.  Time-of-Flight Mass Spectrometry with a Pulsed Glow Discharge Ionization Source. , 1997, Analytical chemistry.

[33]  W. Hang,et al.  Pulsed glow discharge time-of-flight mass spectrometry. Invited lecture , 1996 .

[34]  Peng-yuan Yang,et al.  Microsecond pulsed glow discharge time-of-flight mass spectrometer , 1994 .

[35]  I. Mclaren,et al.  TIME-OF-FLIGHT MASS SPECTROMETER WITH IMPROVED RESOLUTION , 1955 .