论文信息 - Use of Nanoindentation to Characterise the Plasma Damage Region in Low-k Dielectric Films - 字舞流文

Use of Nanoindentation to Characterise the Plasma Damage Region in Low-k Dielectric Films

F. Iacopi | M. V. Hove | Y. Travaly | J. Molina-Aldareguia | I. Ocaña | J. Martínez-Esnaola | M. R. Elizalde | J. Gil-Sevillano