Tailored Deposition by LPCVD of Non-stoichiometric Si Oxides and their Application in the Formation of Si Nanocrystals Embedded in SiO2 by Thermal Annealing
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J. Sangrador | J. Jiménez | B. Morana | M. Avella | Andrés Rodríguez | T. Rodríguez | J. C. G. D. Sande | Á. C. Prieto