Prospects for x-ray lithography

The essentials of proximity x‐ray lithography (XRL) have been established and successful alternative implementations have been demonstrated in academic and industrial laboratories worldwide. Results continue to show that XRL can provide simpler and more robust processes than optical or electron beam alternatives. And it is widely accepted that this becomes more true as lithographic dimensions shrink. So why do we still await the introduction of the first commercial use of XRL? Use of a new technology requires its either attaining the unattainable or excelling at cost/performance. For near term application, XRL must leap the latter hurdle. While most concede the superior robustness of XRL to normal process variation, popular lore has it that availability or an adequate infrastructure limits XRL becoming a process of choice. We discuss the current state of XRL against this competitive challenge and project progress forward. In so doing, we find that XRL is now approaching a critical crossroad. While optical...