论文信息 - Formation of Double Stacking Faults from Polishing Scratches on 4H-SiC (0001) Substrate

Formation of Double Stacking Faults from Polishing Scratches on 4H-SiC (0001) Substrate

Epitaxial layers grown on mechanically lapped 4H-SiC (0001) substrates were analyzed by using scanning ion microscopy (SIM), photoluminescence (PL) mapping and transmission electron microscopy (TEM). Even in the use of substrates with standard nitrogen concentration of 1.3 × 1019 cm-3, double Shockley-type stacking faults were observed to be formed in the epitaxial layer from the interface between the epitaxial layer and the substrate without any external stresses. Surface damaged layer seems to cause the formation of not only 2SSFs but also threading edge dislocation (TED) half-loops during epitaxial growth.

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