Smooth and high-rate reactive ion etching of diamond
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K. Kobashi | T. Hirao | K. Oura | Y. Ando | Y. Nishibayashi
[1] FujishimaAkira,et al. Preparation of Periodic Microstructured Diamond Surfaces , 2000 .
[2] Y. Baik,et al. Aligned diamond nanowhiskers , 2000 .
[3] Akira Fujishima,et al. Fabrication of a Nanostructured Diamond Honeycomb Film , 2000 .
[4] H. Shiomi. Reactive ion etching of diamond in O2 and CF4 plasma, and fabrication of porous diamond for field emitter cathodes , 1997 .
[5] W. Chu,et al. Reactive ion etching of diamond , 1989 .
[6] K. Nojiri,et al. Formation of deep holes in silicon by reactive ion etching , 1987 .
[7] F. Egitto,et al. Plasma etching of organic materials. I. Polyimide in O2–CF4 , 1985 .
[8] G. A. Lincoln,et al. Ion‐beam‐assisted etching of diamond , 1985 .