Etch characteristics of HfO2 films on Si substrates
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David P. Norton | Stephen J. Pearton | K. P. Lee | Byeong-Woo Jeong | J. Shin | K. Baik | S. Pearton | D. Norton | K. Lee | S. Norasetthekul | P. Y. Park | K. H. Baik | J. H. Shin | V. Shishodia | P. Park | S. Norasetthekul | B. Jeong | V. Shishodia
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