Real-time observation of electron-stimulated effects on Si(001)-(2 × 1) by optical reflectance spectroscopic methods

We have studied the process of electron-stimulated defect formation on a Si(001)-(2 × 1) surface by means of a combination of two different surface optical methods, surface differential reflectance spectroscopy and reflectance anisotropy spectroscopy. Time courses obtained with both methods followed an exponential curve during electron irradiation over the range of 100–1000 eV. The spectral features and related physical phenomena are discussed.

[1]  O. Pluchery,et al.  RAS : An efficient probe to characterize Si(001)-(2 x 1) surfaces , 2006 .

[2]  M. Tanaka,et al.  Characterization of initial halogen adsorption on Si(111) surface by scanning tunnelling microscopy: correlation with optical measurements , 2006, Journal of physics. Condensed matter : an Institute of Physics journal.

[3]  M. Tanaka,et al.  Real-time coverage monitoring of initial oxidation processes on Si(001) by means of surface differential reflectance , 2006, Journal of physics. Condensed matter : an Institute of Physics journal.

[4]  O. Pluchery,et al.  Probing the Si-Si dimer breaking of Si(100)2x1 surfaces upon molecule adsorption by optical spectroscopy. , 2005, Physical review letters.

[5]  F. Bechstedt,et al.  Understanding the optical anisotropy of oxidized Si(001) surfaces , 2005 .

[6]  J. Yates,et al.  Electron impact effects on the oxidation of Si(111) at 90 K , 2005 .

[7]  P. W. Wang,et al.  HREELS, TPD and ESD study of electron‐induced decomposition of trimethylamine on Si(100) at 100 K , 2005 .

[8]  N. Witkowski,et al.  Optical response of clean and hydrogen-covered vicinal Si(001)2 × 1 surfaces , 2004 .

[9]  Young-Jin Kim,et al.  Ab initio study of incorporation of O 2 molecules into Si ( 001 ) surfaces: Oxidation by Si ejection , 2004 .

[10]  M. Rudolphi,et al.  Nanostructuring of silicon (100) using electron beam rapid thermal annealing , 2004 .

[11]  T. Shirasawa,et al.  Structure determination of Si(001)-c(4×2) surfaces at 80 K and electron beam effect below 40 K studied by low-energy electron diffraction , 2004 .

[12]  Naoto Kumagai,et al.  Atomic-layer resolved monitoring of thermal oxidation of Si(001) by reflectance difference oscillation technique , 2004 .

[13]  M. Kitajima,et al.  Electron-stimulated athermal surface recrystallization of Si(100) , 2004 .

[14]  K. Shudo,et al.  Reactivity of halogens on a Si(111) surface studied by surface differential reflectivity , 2003 .

[15]  N. Kumagai,et al.  Layer-resolved kinetics of Si oxidation investigated using the reflectance difference oscillation method , 2003 .

[16]  K. Shudo,et al.  Isothermal desorption process of Cl-covered Si(1 1 1) studied by surface differential reflectivity spectroscopy , 2003 .

[17]  J. Yates,et al.  Electrostatic field enhancement of Al(111) oxidation. , 2002, Physical review letters.

[18]  N. Kaneko,et al.  Adsorption process of chlorine on Si(111)7×7 studied by surface differential reflectivity and second harmonic generation , 2002 .

[19]  Peter Weightman,et al.  Reflection anisotropy spectroscopy , 2005 .

[20]  J. H. Weaver,et al.  Electron-Stimulated Modification of Si Surfaces , 1999 .

[21]  W. J. Choyke,et al.  Enhanced silicon oxide film growth on Si (100) using electron impact , 1997 .

[22]  John F. McGilp,et al.  Optical characterisation of semiconductor surfaces and interfaces , 1995 .

[23]  J. Boland Scanning tunnelling microscopy of the interaction of hydrogen with silicon surfaces , 1993 .

[24]  P. Avouris,et al.  STM studies of Si(100)-2×1 oxidation: defect chemistry and Si ejection , 1992 .

[25]  M. Kawashima,et al.  Optical investigation of GaAs growth process in molecular beam epitaxy and migration-enhanced epitaxy , 1991 .

[26]  R. D. Ramsier,et al.  Electron-stimulated desorption: Principles and applications , 1991 .

[27]  J. P. Harbison,et al.  Application of reflectance difference spectroscopy to molecular‐beam epitaxy growth of GaAs and AlAs , 1988 .

[28]  Cardona,et al.  Temperature dependence of the dielectric function and interband critical points in silicon. , 1987, Physical review. B, Condensed matter.