Defect structure and electronic properties of SiOC:H films used for back end of line dielectrics
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Patrick M. Lenahan | Sean W. King | J. Bielefeld | David J. Michalak | J. Bielefeld | D. Michalak | S. King | P. Lenahan | B. C. Bittel | E. Mays | T. A. Pomorski | C. Ege | T. Pomorski | C. Ege | E. Mays | B. Bittel
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