论文信息 - High Quality and Low Thermal Budget Silicon Nitride Deposition Using PECVD for Gate Spacer, Silicide Block and Contact Etch Stopper - 字舞流文

High Quality and Low Thermal Budget Silicon Nitride Deposition Using PECVD for Gate Spacer, Silicide Block and Contact Etch Stopper

Tadahiro Ohmi | Hironori Tanaka | Rihito Kuroda | S. Sugawa | Akinobu Teramoto | Yukihisa Nakao

[1] Y. Nishi,et al. Handbook of Semiconductor Manufacturing Technology , 2007 .