0.35μm i-line attenuated psm mask repair by focused ion beam technology

This paper addresses the capabilities of the Micrion 8000 FIB (Focused Ion Beam) Phase Shift Mask Repair tool to repair clear defects and opaque defects found on Chrome-based binary and attenuated phase shift masks, and MoSi-based attenuated phase shift masks for 0.35μm lithography. For a repair to be successful, the repair must: match size, shape, and position of the defect, reproduce the desired transmission, minimize damage to the underlying substrate, minimize damage to surrounding non-defect areas, and finally, the repair must be durable. For the production environment, a repair tool must be very reliable and easy to use as well. The Micrion 8000 FIB Phase Shift Mask Repair tool incorporates the above requirements.