论文信息 - Atomic surface control of Ge(100) in MOCVD reactors coated with (Ga)As residuals - 字舞流文

Atomic surface control of Ge(100) in MOCVD reactors coated with (Ga)As residuals

I. Rey‐Stolle | E. Barrigón | S. Brückner | O. Supplie | P. Kleinschmidt | A. Dobrich | T. Hannappel | M. May | A. Paszuk | M. Nandy | Aaron Gieß