论文信息 - Rapid thermal-cyclic atomic-layer etching of titanium nitride in CHF3/O2 downstream plasma - 字舞流文

Rapid thermal-cyclic atomic-layer etching of titanium nitride in CHF3/O2 downstream plasma

M. Hori | K. Ishikawa | Nobuya Miyoshi | M. Izawa | Hiroyuki Kobayashi | Kazunori Shinoda | K. Shinoda | H. Kobayashi | N. Miyoshi