Electrochemical behavior of Portland cement pastes containing phosphonates

Abstract An impedance measurement technique was used to investigate the effects of aminotri(methylenephosphonic acid) (ATMP), 1-hydroxyethylidene-1, 1-diphosphonic acid (HEDP), and diethylenetriaminepenta (methylenephosphonic acid) (DTPMP) on the hydration process and setting behavior of portland cement pastes. It was demonstrated that the impedance and capacitive responses can be used to characterize setting behavior and microstructural development of the hydrating pastes containing these chemical admixtures. The presence of a long induction period of up to 20 and more than 75 hours is revealed by the impedance curves of pastes containing ATMP, HEDP, and DTPMP at dosages of 0.05% and 0.2%, respectively. This confirms that phosphonates are efficient retarders. These compounds appear to have strong chelating or complexing capability, potentially poisoning CH and C-S-H nucleation. Stabilization of the C-S-H (metastable) film on the surface of cement grains appears to cause retarding effect.

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