Analytical optimization of high-transmission attenuated phase-shifting reticles
暂无分享,去创建一个
[1] Christopher A. Spence,et al. Impact of optical enhancement techniques on the mask error enhancement function (MEEF) , 2000, Advanced Lithography.
[2] Michael T. Reilly,et al. Effects of mask bias on the mask error enhancement factor (MEEF) of contact holes , 2001, SPIE Advanced Lithography.
[3] Alfred K. K. Wong,et al. The mask error factor in optical lithography , 2000 .
[4] Yuri Granik,et al. Using OPC to optimize for image slope and improve process window , 2003, Photomask Japan.
[5] Wen-an Loong,et al. Simulations of Mask Error Enhancement Factor in 193 nm Immersion Lithography , 2006 .
[6] Vincent Wiaux,et al. Mighty high-T lithography for 65-nm generation contacts , 2003, SPIE Advanced Lithography.
[7] David Z. Pan,et al. True process variation aware optical proximity correction with variational lithography modeling and model calibration , 2007 .
[8] Chun-Kuang Chen,et al. Customized illumination aperture filter design for through-pitch focus latitude enhancement of deep submicron contact hole printing , 2002 .
[9] John S. Petersen. Analytical description of antiscattering and scattering bar assist features , 2000, Advanced Lithography.
[10] Franklin M. Schellenberg,et al. MEEF in theory and practice , 1999, Photomask Technology.
[11] Ralf Ziebold,et al. Image degradation due to phase effects in chromeless phase lithography , 2006, SPIE Photomask Technology.
[12] Yuri Granik,et al. MEEF as a matrix , 2002, SPIE Photomask Technology.
[13] Anthony Yen,et al. Mask error tensor and causality of mask error enhancement for low- k 1 imaging: theory and experiments , 2004 .
[14] James C. Word,et al. Lithographic tradeoffs between different assist feature OPC design strategies , 2003, SPIE Advanced Lithography.