Development of coherent EUV scatterometry microscope with high-order harmonic for EUV mask inspection
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Katsumi Midorikawa | Hiroo Kinoshita | Tetsuo Harada | Yutaka Nagata | Masato Nakasuji | K. Midorikawa | H. Kinoshita | T. Harada | Y. Nagata | M. Nakasuji
[1] I. Christov,et al. Highly coherent light at 13 nm generated by use of quasi-phase-matched high-harmonic generation. , 2004, Optics letters.
[2] Kenichi Takahara,et al. A novel defect detection optical system using 199-nm light source for EUVL mask , 2010, Advanced Lithography.
[3] A. G. Cullis,et al. Hard-x-ray lensless imaging of extended objects. , 2007, Physical review letters.
[4] Takeo Watanabe,et al. Phase Imaging of Extreme-Ultraviolet Mask Using Coherent Extreme-Ultraviolet Scatterometry Microscope , 2013 .
[5] Kenneth A. Goldberg,et al. EUV pattern defect detection sensitivity based on aerial image linewidth measurements , 2009 .
[6] K. Midorikawa,et al. High-throughput, high-damage-threshold broadband beam splitter for high-order harmonics , 2004, Conference on Lasers and Electro-Optics, 2004. (CLEO)..
[7] U. Keller,et al. Quantum-path interferences in high order harmonic generation , 2007, 2007 European Conference on Lasers and Electro-Optics and the International Quantum Electronics Conference.
[8] K. Midorikawa,et al. Development of Coherent Extreme-Ultraviolet Scatterometry Microscope with High-Order Harmonic Generation Source for Extreme-Ultraviolet Mask Inspection and Metrology , 2012 .
[9] Catherine M. Herne,et al. Phase matching of high-order harmonics in hollow waveguides , 1999, 2404.00071.
[10] Takeo Watanabe,et al. Mask observation results using a coherent extreme ultraviolet scattering microscope at NewSUBARU , 2009 .
[11] Takeo Watanabe,et al. The coherent EUV scatterometry microscope for actinic mask inspection and metrology , 2011, Photomask Japan.
[12] J R Fienup,et al. Phase retrieval algorithms: a comparison. , 1982, Applied optics.
[13] Takeo Watanabe,et al. Study of Critical Dimensions of Printable Phase Defects Using an Extreme Ultraviolet Microscope , 2009 .
[14] Hiroo Kinoshita,et al. Development of coherent scatterometry microscope , 2011 .
[15] K. Midorikawa,et al. Conclusive evidence of an attosecond pulse train observed with the mode-resolved autocorrelation technique. , 2006, Physical review letters.
[16] Kenneth A. Goldberg,et al. Printability of native blank defects and programmed defects and their stack structures , 2011, Photomask Technology.
[17] Takeo Watanabe,et al. Imaging of extreme-ultraviolet mask patterns using coherent extreme-ultraviolet scatterometry microscope based on coherent diffraction imaging , 2011 .
[18] K. Midorikawa,et al. Single-shot spatial-coherence measurement of 13 nm high-order harmonic beam by a Young's double-slit measurement. , 2007, Optics letters.
[19] L. Poletto,et al. Isolated Single-Cycle Attosecond Pulses , 2006, Science.
[20] Iwao Nishiyama,et al. Analysis of Printability of Scratch Defect on Reflective Mask in Extreme Ultraviolet Lithography , 2006 .
[21] D. Stearns,et al. Practical approach for modeling extreme ultraviolet lithography mask defects , 2002 .
[22] Ivanov,et al. Theory of high-harmonic generation by low-frequency laser fields. , 1994, Physical review. A, Atomic, molecular, and optical physics.
[23] Toshihiko Tanaka,et al. Actinic Mask Blank Inspection and Signal Analysis for Detecting Phase Defects Down to 1.5 nm in Height , 2009 .
[24] Gregg Inderhees,et al. Inspecting EUV mask blanks with a 193nm system , 2010, Advanced Lithography.
[25] J. Rodenburg,et al. A phase retrieval algorithm for shifting illumination , 2004 .
[26] Katsumi Midorikawa,et al. Development of high-throughput, high-damage-threshold beam separator for 13 nm high-order harmonics. , 2006, Optics letters.
[27] Takeo Watanabe,et al. Critical Dimension Measurement of an Extreme-Ultraviolet Mask Utilizing Coherent Extreme-Ultraviolet Scatterometry Microscope at NewSUBARU , 2011 .