论文信息 - Determination of the heavy-metal ion-dose after implantation in silicon-wafers by total reflection X-ray fluorescence analysis - 字舞流文

Determination of the heavy-metal ion-dose after implantation in silicon-wafers by total reflection X-ray fluorescence analysis

Maria Becker | R. Klockenkämper | H. Bubert

[1] Maria Becker,et al. Determination of the implantation-dose in silicon wafers by x-ray fluorescence analysis , 1990 .

[2] U. Reus. Total reflection X-ray fluorescence spectrometry: matrix removal procedures for trace analysis of high-purity silicon, quartz and sulphuric acid , 1989 .

[3] G. Morrison. Quantifications of SIMS , 1982 .