Highly selective HBr etch process for fabrication of triple-gate nano-scale SOI-MOSFETs
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J. K. Efavi | Max C. Lemme | Heinrich Kurz | Colin Welch | T. Mollenhauer | W. Henschel | H. D. B. Gottlob | H. Kurz | M. Lemme | W. Henschel | C. Welch | T. Mollenhauer | H. Gottlob | J. Efavi
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