Systematic Study of the SiOx Film with Different Stoichiometry by Plasma-Enhanced Atomic Layer Deposition and Its Application in SiOx/SiO2 Super-Lattice
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T. Jen | Hongliang Lu | Jian-Guo Yang | Hongping Ma | Wei Huang | Jia-He Yang | Ji-jun Feng | Guang-Jie Yuan | Hong-Liang Lu | Liyuan Zhu | H. Lu