论文信息 - Electron attachment to sulfur oxyhalides: SOF2, SOCl2, SO2F2, SO2Cl2, and SO2FCl attachment rate coefficients, 300-900 K. - 字舞流文

Electron attachment to sulfur oxyhalides: SOF2, SOCl2, SO2F2, SO2Cl2, and SO2FCl attachment rate coefficients, 300-900 K.

N. Shuman | T. Miller | A. Viggiano | J. Friedman | J. Van Doren | P. Nguyen | Michael F. Bardaro | Connor M Caples | M. Campbell | Cindy Zweiben | Jane Van Doren