论文信息 - Mechanism of plasma-induced damage to low-k SiOCH films during plasma ashing of organic resists - 字舞流文

Mechanism of plasma-induced damage to low-k SiOCH films during plasma ashing of organic resists

M. Hori | S. Takashima | K. Takeda | M. Fukasawa | K. Nagahata | T. Tatsumi | Keiji Oshima | Yudai Miyawaki