Fabrication of nanocone forests with high optical absorption based on a plasma repolymerization technique

Nanocone forests with high optical absorption and high photoelectric conversion efficiency are presented in this work. To prepare the nanocone forests, plasma repolymerization forming nanowires during Ar-plasma bombardment is the key technique, and the self-generated nanowires are further utilized as nanomasks in reactive ion etching for nanocone forests. Based on the achieved absorption of a 700nm-high nanocone forest, which is around 98% within a 300~1100 nm wavelength range, a high ultimate efficiency of photoelectric conversion around 43.6% is theoretically obtained. Furthermore, a feasible fabrication process is proposed for solar cells, and it predicts further potential applications of the nanocone forests for powerMEMS devices.

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